We used novel manufacturing technology to create objective lenses with simultaneously improved numerical aperture, working distance, and aberration correction. Their high numerical aperture (NA) and 3 mm working distance improves sample transport, enabling greater throughput in automated semiconductor inspection. 20X and 50X lenses are available.

High Numerical Aperture and Long Working Distance MX Plan Semi-Apochromat Objectives – MXPLFLN-BD

• Designed for brightfield, darkfield, differential interference contrast (DIC), fluorescence, and simple polarized light observation methods
• Combines a high NA, long working distance, and image flatness
• Available in 20X and 50X magnifications with a 3 mm working distance  

MXPLFLN50XBD
The MXPLFLN50XBD is our first 50X objective with a 0.8 numerical aperture and 3 mm working distance. Compared to a LMPLFLN100X objective, the observation range is four times greater thanks to the 0.8 NA at 50X magnification.

MXPLFLN20XBD
The MXPLFLN20XBD is our first 20X objective with a 0.55 numerical aperture and 3 mm working distance. Its high NA and high image flatness produces homogenous images that are ideal for stitching.