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Fast Failure Analysis

Analyzing Semiconductor Wafers used in High-Frequency Devices

Compound semiconductors can process at high speed and under high voltage, making them ideal for 5G applications. Because they are critical electronic device components, checking them for defects is important.

Analyzing Semiconductor Wafers used in High-Frequency Devices

Challenges of Measuring Semiconductor Wafers

Wafers are typically inspected for defects using a metallurgical microscope. One common problem is that it is easy to lose sight of a defect when changing to a higher magnification objective to take a closer look.

Flexible Imaging for Fast Wafer Measurement

The DSX1000 digital microscope enables you to switch observations—such as differential interference contrast—with the touch of a button. In addition, the microscope’s optical zoom enables seamless macro to micro imaging, so you won’t lose sight of any defects.

Wafer defect DIC observation

Wafer defect DIC observation

Wafer defect DIC observation:
An observation method suitable for visualizing nano-level irregularities, foreign matter, and scratches.

DSX1000 Digital Microscope

DSX1000 Digital Microscope

Observation of Resist Residues in Semiconductor Materials

Photoresist materials play an important role in the etching process for circuit
formation. The circuit formation lithography process consists of applying, masking, exposing, and then removing the resist material. Resist residue after removal can be an issue. 

Observation of Resist Residues in Semiconductor Materials

Challenge of Optical Microscope Inspection

Even when an optical microscope is used, resist residue can be overlooked. It is important to choose a microscope with the right features for this application.

Easy Detection of Resist Residues

The BX53M upright metallurgical microscope supports fluorescence observation, offering an easy solution for the detection of organic resist residues with light-emitting properties. You can distinguish resist residues from other contamination by the differences in their emission characteristics.


MIX (fluorescence and darkfield) observation:

Easy Detection of Resist Residues

Resist material in an integrated circuit (IC) pattern

Easy Detection of Resist Residues

Photoresist residue on a wafer sample

BX53M Upright Metallurgical Microscope

BX53M
Upright Metallurgical Microscope

Observing the Molding Condition of Optical Communication Waveguides

Manufacturers must validate the molding condition of optical waveguides, which are components used in optical communications. Since an optical waveguide is surrounded by glass, observation using the epi-illumination (reflected light) of a microscope is impossible. Transmission illumination is essential for this application.

Observing the Molding Condition of Optical Communication Waveguides

Inspection Challenges Using a Digital or Measuring Microscope 

It is possible to observe optical waveguides using a transmitted-light measuring microscope or a traditional digital microscope, however, the observation image will typically be blurry or unclear.

Clear Observation of the Molding Condition

When combined with the DP74 digital microscope camera, the BX53M upright metallurgical microscope’s high optical performance and differential interference contrast function enable you to clearly observe and capture high-resolution images of the molding condition of an optical waveguide.

Clear Observation of the Molding Condition

BX53M Upright Metallurgical Microscope

BX53M
Upright Metallurgical Microscope

DP74 Digital Microscope Camera

DP74
Digital Microscope Camera

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