Overview

Super Long Working Distance Objective Lens

Provides a long working distance between the lens and sample
Suitable for observing samples with large irregularities such as molds and metal parts

	Working Distance (mm)	Magnification _{*Based on a 27-inch monitor}	Field of View (μm)	Numerical Aperture
DSX10-SXLOB1X
	51.7	23 - 164X	19,200 - 2,740	0.03
	_{*DSX10-SXLOB1X does not support PO observation}
DSX10-SXLOB3X
	66.1	49 - 493X	9,100 - 910	0.09
	_{*DSX10-SXLOB3X does not support PO observation}
DSX10-SXLOB10X
	41.1	164 - 1644X	2,740 - 270	0.2
	_{*DSX10-SXLOB10X does not support PO observation}

	Working Distance (mm)	Magnification _{*Based on a 27-inch monitor}	Field of View (μm)	Numerical Aperture
DSX10-XLOB3X
	30	49 - 493X	9,100 - 910	0.09
	_{*DSX10-XLOB3X does not support PO observation}
DSX10-XLOB10X
	30	164 - 1644X	2,740 - 270	0.3

DSX10-XLOB20X
	20	320 - 3280X	1,370 - 140	0.4

DSX10-XLOB40X
	4.5	650 - 6570X	690 - 70	0.8

Delivers high performance at the nano scale
Observe samples that require higher resolution such as semiconductors and wafers

	Working Distance (mm)	Magnification _{*Based on a 27-inch monitor}	Field of View (μm)	Numerical Aperture
MPLFLN1.25X
	3.5	26 - 206X	17,100 - 2,190	0.04
	_{*MPLFN1.25X only supports BF and OBQ observation}
MPLFLN2.5X
	10.7	44 - 411X	10,200 - 1,100	0.08
	_{*MPLFN2.5X only supports BF and OBQ observation}
MPLFLN5XBDP
	12	82 - 822X	5,480 - 550	0.15

MPLFLN10XBDP
	6.5	164 - 1644X	2,740 - 270	0.25

MPLFLN20XBDP
	3	320 - 3280X	1,370 - 140	0.4

MPLFLN50XBDP
	1	820 - 8220X	550 - 55	0.75

MPLAPON50X
	0.35	820 - 8220X	550 - 55	0.95
	_{*MPLAPON50X does not support DF and MIX observation}
LMPLFLN10XBD
	10	164 - 1644X	2,740 - 270	0.25

LMPLFLN20XBD
	12	320 - 3280X	1,370 - 140	0.4

LMPLFLN50XBD
	10.6	820 - 8220X	550 - 55	0.5