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LEXT OLS4500 is Nano Search Microscope which is combined a laser microscope and scanning probe microscope (SPM) in the same instrument to allow observation and measurement over a wide range of magnifications (from around 50x up to 1,000,000x)
Magnification/Observation Method Switching with Revolving Nosepiece | Four objectives ranging from low to high magnifications are installed on the motorized revolving nosepiece together with an SPM unit. The magnification and observation method can be switched seamlessly so that the observation target will remain captured within a field of view. The OLS4500 performs fast search in nano-surface texture. |
With a wide range of magnifications and various observation methods, backed by advanced optical technology, the optical microscope makes it easy to locate the observation target. In addition, laser DIC (Differential Interference Contrast) observation enables to visualize nanometric order irregularity in live image. |
Once the sample has been placed on the OLS4500 microscope, all subsequent operations can be performed on the same microscope. The ability to locate the observation target quickly and accurately with SPM allows target image acquisition in one scanning area.
As the OLS4500 is an integrated optical, laser and probe microscope system, you can switch between the three microscopic modes as required for observation and evaluation, without having to replace the sample itself. Each of the integrate microscopes is equipped with an array of powerful functions to assure optimum output. |
A white LED is used as the light source to ensure clear color images with excellent color reproduction. The four objectives enable observation at various magnifications, ranging from low to high. Making full use of the features of optical microscope, the OLS4500 is capable of BF (Brightfield) observation – the most commonly used, DIC (Differential Interference Contrast) observation for stereoscopic visualization of fine surface texture by enhancing contrast, and simplified polarized light observation that represents the polarization characteristics of the sample with different colors. Other functions include HDR (High Dynamic Range), which synthesizes several images captured by varying the exposure time to obtain an image with well-balanced brightness and enhanced texture. The OLS4500 can quickly find the area of interest using various observation methods.
Thanks to a short-wavelength 405nm laser light, a higher-aperture (high-N.A.) objective lenses and confocal optics, high X-Y resolution is available so that objects not visible with the optical microscope can be observed in clear images. Laser DIC observation makes possible live observation of nanometer micro surface. |
Four objectives ranging from low to high magnifications are installed on the motorized revolving nosepiece together with the SPM unit. 50X and 100X live observation mode using the optical microscope or LSM places the SPM scanning area in the center of the field. The area of interest can be approached accurately by setting a target mark over the area and switching to the probe scan mode. This means that the target image can be obtained with a single SPM scan, improving work efficiency and reducing wear of the cantilever.
Guidance for Easy Switching to SPM Observation |
Preparations for SPM observation, such as cantilever installation and scanning area setting, can be performed by following the guidance display, which means that even operators with little experience can safely perform preliminary work. |
Newly Developed Compact SPM Scanner Head | The OLS4500 employs a nosepiece-mounting-type SPM scanner head. Because the objective and the cantilever tip are in the coaxial, parfocal positioning, the observation point will not be lost from the field of view even after switching to SPM mode. The newly developed compact SPM head is improved rigidity, so it features reducing image noise and improving responsiveness. |
The navigator function allows closer viewing of the required region in an image acquired with the probe scan mode by further increasing the magnification. The target image can be obtained by simply setting the magnifying region using the cursor and starting probe scan. The scanning area can be set freely, allowing observation and measurement to be performed more quickly and efficiently.
Navigator magnifies a 3.5 μm x 3.5 μm area on a 10 μm x 10 μm image
Curvature Measurement (Hard Disk Pits) | Images acquired in SPM measurement mode can be analyzed to suit the requirements of different applications, and the results can be exported as the CSV format. The OLS4500 provides the following analysis functions.
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This mode scans the setting area by the cantilever statically while keeping the repulsive force constantly between the cantilever and sample in order to visualize the height information of the sample. It can also be used for the force curve measurement.
Metallic Thin Film |
This mode vibrates the cantilever at near the resonance frequency and controls the Z-direction distance to make the vibration amplitude constant in order to visualize the height information of the sample. It is suitable for samples with soft surfaces such as polymers or viscous materials.
Aluminium Surface |
This mode detects phase delays in the cantilever vibration during scanning in the dynamic mode. It can visualize the difference in physical properties on the sample surface.
Polymer Film |
This mode applies a bias voltage to the sample to detect and visualize the current flowing between the cantilever and sample. It can also be used for I/V measurements.
Sample of SiO2 pattern on a Si substrate. The yellow region in the height image (left) is SiO2, which is displayed blue (region without current flow) in the current image(right). These images show that a substrate has regions without current flow. |
This mode applies an AC voltage through the conductive cantilever, detects the electrostatic force working between the cantilever and sample, and visualizes the electric potential on the sample surface. It is also called the Kelvin Force Microscope (KFM) mode.
Sample of magnetic tape. The surface potential image shows that potential difference of a few hundreds of mV is distributed on the sample surface. This distribution is regarded to reflect the presence of irregularities in the lubrication layer on the tape surface. |
This mode scans the setting area with magnetized cantilever in phase mode and detects the phase delays in the cantilever vibration then visualizes the magnetic information on the sample surface. It is also called the Magnetic Force Microscope (MFM) mode.
Sample of hard disk. The image shows the distribution of magnetic property. |
Thanks to dedicated objective lenses with high numerical apertures and a dedicated optical system that obtains superior performance from a 405 nm laser, the OLS4500 can reliably measure acute-angled samples that were previously impossible to measure.
LEXT-Dedicated Objective Lenses | Razor with an Acute Angle |
Thanks to a short-wave length 405 nm laser light and a higher-aperture objective lens, 0.12 μm X-Y resolution is available. As a result, the OLS4500 can perform submicron measurements of sample's surface. Combined with a high-precision linear scale and Olympus original intensity detection technology, this allows high-definition imaging, enabling accurate height measurement from the submicron to the hundreds of microns range. In addition, the OLS4500 is able to assure both "accuracy", which indicates how close a measurement value is to its true value and "repeatability", which indicates the degree of variations among repeated measurement values, both show the performance of measuring tool.
0.12 μm Line and Space Pattern | (MPLAPON50XLEXT) STEP Height standard Type B, PTB-5, Institut für Mikroelektronik, Germany, 6 nm Detection in Height Measurement |
Though the field of view at high-magnification image is narrow in general, the stitching function of the OLS4500 can provide image data with high resolution and a wide field area by stitching together up to 625 images. The obtained wide-field image can be subjected to 3D display and 3D measurement.
With continuous reductions in the size and weight of recent industrial products, the parts composing them are also subject to miniaturization. This trend toward micro-miniaturization of component parts is increasing the importance of surface roughness measurement, as well as geometry measurement. Reflecting these market needs, the ISO added the LSM and AFM to the list of 3D surface texture measuring instruments (ISO 25178-6). This means that non-contact surface roughness measurement is recognized as an official evaluation standard just like the traditional contact surface roughness gauge . The OLS4500 comes with roughness parameters conforming to the ISO. |
Non-contact surface roughness measurement can obtain the plane roughness as well as the line roughness. The plane roughness measurement can also identify roughness distribution and properties in a region designated on the sample surface so that they can be collated with the 3D image for evaluation. The OLS4500 can measure the surface roughness using either the LSM or SPM function. These two functions can be selected according to the sample properties or observation purpose.
Plane Roughness Measurement with LSM
(105 μm x 105 μm) Bonding Pad | Plane Roughness Measurement with SPM
(10 μm x 10 μm) |
The OLS4500 comes with the same Surface Profile Parameters as contacttype surface roughness gauges, offering compatible operability and measurement results.
Primary Profile | Pp, Pv, Pz, Pc, Pt, Pa, Pq, Psk, Pku, Psm, PΔq, Pmr(c), Pδc, Pmr |
Roughness Profile | Rp, Rv, Rz, Rc, Rt, Ra, Rq, Rsk, Rku, Rsm, RΔq, Rmr(c),Rδc, Rmr, RZJIS, Ra75 |
Waviness Profile | Wp, Wv, Wz, Wc, Wt, Wa, Wq, Wsk, Wku, Wsm, WΔq, Wmr(c), Wδc, Wmr |
Bearing Area Curve | Rk, Rpk, Rvk, Mr1, Mr2 |
Motif | R, Rx, AR, W, Wx, AW, Wte |
Roughness Profile (JIS1994) | Ra(JIS1994), Ry, Rz(JIS1994), Sm, S, tp |
Others | R3z, P3z, PeakCount |
The OLS4500 comes with roughness (3D) parameters conforming to ISO 25178. By evaluating the planer area, high-reliability analysis is made possible.
Amplitude Parameters | Sq, Ssk, Sku, Sp, Sv, Sz, Sa |
Functional Parameters | Smr(c), Sdc(mr), Sk, Spk, Svk, SMr1, SMr2, Sxp |
Volumetric Parameters | Vv(p), Vvv, Vvc, Vm(p), Vmp, Vmc |
Lateral Parameters | Sal, Str |
High-Resolution XY Scanning of Laser Microscope (image illustration) | The X-Y plane resolution of an optical microscope depends greatly on the wavelength of the light used. The LSM employs short-wavelength light so its X-Y plane resolution is superior to that of a traditional microscope which uses visible light. The OLS4500 incorporates a laser light with a short wavelength of 405 nm and combines a dedicated high-aperture (high-N.A.) objective and confocal optics to achieve X-Y plane resolution of 0.12 μm. Its XY scanning function - which uses an Olympus-original 2D scanner - makes possible high-resolution scanning of 4096 x 4096 pixels (max.). |
Principles of Probe Microscope | SPM is the generic name of microscopes which perform 3D type observation of samples by approaching a small probe with a tip curvature of about 10 nm to the sample surface and scanning the sample, while detecting the dynamic and electrical interactions between the probe and sample. One of the typical SPMs is the AFM (Atomic Force Microscope), which images minute surface texture of the sample by detecting the attractive and repulsive forces between the probe and sample surface. Observation at the nanometric level makes it possible to capture the texture of the sample finely. |
Optical Path of SPM Sensor | The OLS4500 employs an optical lever system that can detect the micro-deflection (displacement) of the cantilever carrying the probe on the tip with high sensitivity. By reflecting the laser beam on the back of the cantilever and applying Z-axis drive using a piezo device, the beam hits the specified point on the photodetector so that the system can read a minute Z-direction displacement. |
Polymer Film | The scanning probe mode incorporates various modes for use in texture observation and measurements of the sample surface, as well as for analysis of the physical properties. The modes available with the OLS4500 are as follows.
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The probe is placed on the tip of a sheet-type cantilever with a length of approximately 100 to 200 μm. The spring constant and resonance frequency of the cantilever are selected according to the sample feature. As the probe wears after repeated scanning, the cantilever tip should be replaced either periodically or as required.
The X-Y plane resolution of the SPM is determined by the probe tip diameter. The cantilevers developed and fabricated by Olympus assure stable probe tip quality to lead to high reliability. Unique designs such as “TipView” structure facilitates exact probe positioning, while the “New Concept Chip” improves usability as well as accuracy.
*A cantilever product catalog is separately available.
High Q factor for high-resolution measurement
Widely used in dynamic mode measurements. It is suitable for surface roughness measurement.
Viscoelasticity measurement with high reproducibility
Spring constant of 2 N/m (Nom.) is smallest of silicon cantilevers for AC series. It is therefore suitable for measurements of viscoelasticity of soft samples.
Low wear, excellent durability
Widely used in contact mode measurement, due to the cantilever softness and probe wear resistance. Each chip has two cantilevers of differing lengths of 100 μm and 200 μm.
The cantilever needs to be replaced, depending on the frequency of use. As the motorized revolving nosepiece, SPM scanner head and cantilever are precisely aligned, you can complete replacement of the cantilever just by inserting the position-aligned cantilever holder into the SPM scanner head. A special alignment tool is provided for use in the positioning of the cantilever and holder so that accurate adjustment is easy for anyone. Other types of cantilevers can also be replaced using the same procedure, thereby improving the efficiency of observation and measurement.
Cantilever positioning alignment tool |
LSM Section > Light Source/Detector | Light Source: 405 nm Semiconductor Laser, Detector: Photomultiplier |
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LSM Section > Total Magnification | 108x – 17,280x |
LSM Section > Zoom | Optical Zoom: 1x – 8x |
LSM Section > Measurement > Planar Measurement > Repeatability | 100x : 3σn-1=0.02μm、50x:3σn-1=0.04μm、20x:3σn-1=0.1μm |
LSM Section > Measurement > Planar Measurement > Accuracy | Measurement Value ±2% |
LSM Section > Measurement > Height Measurement > System | Revolving Nosepiece Vertical-Drive System |
LSM Section > Measurement > Height Measurement > Stroke | 10mm |
LSM Section > Measurement > Height Measurement > Scale Resolution | 0.8nm |
LSM Section > Measurement > Height Measurement > Movement Resolution | 10nm |
LSM Section > Measurement > Height Measurement > Display Resolution | 1nm |
LSM Section > Measurement > Height Measurement > Repeatability | 100x :σn-1= 0.012μm、50x:σn-1=0.012μm、20x:σn-1=0.04μm |
LSM Section > Measurement > Height Measurement > Accuracy | 0.2+L/100 μm or Less (L=Measuring Length) |
LSM Section > Color Observation Section > Light Source/Detector | Light Source: White LED, Detector: 1/1.8-Inch 2-Megapixel Single-Panel CCD |
LSM Section > Color Observation Section > Zoom | Digital Zoom: 1x – 8x |
LSM Section > Revolving Nosepiece | Motorized BF Sextuple Revolving Nosepiece |
LSM Section > Differential Interference Contrast Unit | Differential Interference Contrast Slider: U-DICR, Polarizing Plate Unit Built-In |
LSM Section > Objective Lens | BF Plan Semi-apochromat 5x, LEXT-Dedicated Plan Apochromat 20x, 50x, 100x |
LSM Section > Z Focusing Unit Stroke | 76 mm |
LSM Section > XY Stage | 100 x 100 mm (Motorized Stage) |
SPM Section > Measurement mode | Contact mode, Dynamic mode, Phase mode, Current mode*, Surface Potential (KFM) mode*, Magnetic Force (MFM) mode* |
SPM Section > Displacement detection | Optical lever system |
SPM Section > Light source | 659 nm Semiconductor Laser |
SPM Section > Detector | Photodetector |
SPM Section > Max. scanning range | X-Y: Max. 30μm x 30μm、Z: Max. 4.6μm |
SPM Section > Cantilever mount | One-touch mount using cassette-type cantilever holder. With the pre-alignment using the dedicated special tool for cantilever mounting, optical alignment is not required when replacing the cantilever |
System > Total weight | Approx. 440 kg (excluding table) |
System > Input rating | 100 - 120 V/220 - 240V, 600VA, 50/60 Hz |
* Optional
Model | Magnification | Field of View | Working Distance (WD) | Numerical Aperture (NA) |
MPLFLN5X | 108-864X | 2,560-320μm | 20.0mm | 0.15 |
MPLAPON20XLEXT | 432-3,456X | 640-80μm | 1.0mm | 0.60 |
MPLAPON50XLEXT | 1,080-8,640X | 256-32μm | 0.35mm | 0.95 |
MPLAPON100XLEXT | 2,160-17,280X | 128-16μm | 0.35mm | 0.95 |
Application (Usage) | Product Name | Type | Chip Number | Cantilever | Probe | Material | Coating Metal | ||
Resonance Frequency (kHz) | Spring Constant (N/m) | Height (μm) | Radius (nm) | Probe / Lever | Probe side / Reflex side | ||||
Dynamic mode/ Phase Mode | OMCL-AC160TS-C3 | Standard silicon | 24 | 300 | 26 | 14 | 7 | Si / Si | Non / Al |
OMCL-AC240TS-C3 | Medium-soft silicon | 24 | 70 | 2 | 14 | 7 | Si / Si | Non / Al | |
Contact Mode | OMCL-TR800PSA-1 | Standard silicon nitride | 34 | 73 / 24 | 0.57 / 0.15 | 2.9 | 7 | SiN / SiN | Non / Au |
Surface potential mode | OMCL-AC240TM-B3 | Silicon for electrical measurement | 18 | 70 | 2 | 14 | 15 | Si / Si | Pt/Al |
• The dimensions and mechanical properties shown above are typical values.
• Pay special attention as cantilevers are very small and subject to danger of getting could get into your eyes or be accidentally ingested.
• For information on using cantilevers for Current mode and Magnetic Force mode, please contact your Olympus dealer.
• In addition to the cantilevers shown here, a wide variety of cantilevers are available from Olympus. Please contact your Olympus dealer for details.
Color Printing Optical Microscope (50x) | Color Printing SPM (Scanning area: 5 μm x 5 μm, 3D image) |
Lactic Acid Bacteria LSM (Scanning area: 100 μm x 100 μm) | Lactic Acid Bacteria SPM (Scanning area: 20 μm x 20 μm, height image) |
Toner Particle LSM (Scanning area: 80 μm x 80 μm, Right above: 10 μm x 10 μm) | Toner Particle SPM (Scanning area: 1 μm x 1 μm, 3D image) |
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